Table Top Ultra High Intensity Ti:Sapphire Laser

Item	Product
A	Table Top Ultra High Intensity Laser
A.1	Laser Oscillator
1	Trestles Finesse Ti:sapphire based 50 fs laser oscillator with built in DPSS pump laser. Pulse width: sub 50 fs Tunable range: 775-850 nm Repetition rate: 83 MHz Average output power: ≥ 350 mW (at 3 W pump power, pump conversion efficiency 12-15%) Energy stability (±% p/p): < 3% Noise: < 1% Spatial mode: TEM₀₀ Beam diameter at 1/e²: < 2 mm Beam divergence: < 3 mrad Polarization: linear-horizontal Table top dimensions: 942 X 360 X 192 mm DPSS Pump Laser Power: > 4 W Wavelength: 532 nm Beam size: 2.5 mm Transverse mode: TEMoo Divergence: < 0.4 mrad M2 < 1.1 Power stability (rms) < 1.0 % Noise (1Hz-6MHz - rms) < 0.5 % Polarization ratio: 100:1 Supply Voltage: 220 VAC 50-60 Hz SHG Unit Trestles Input Wavelength: 715-950 nm Output Wavelength: 357-475 nm Efficiency: >12% Pulse Broadening: <50 fs Input Polarization: Linear, Horizontal Output Polarization: Linear, Vertical Nonlinear crystal: BBO, angle tuning
A.2 A.3 A.4	Pulse Stretcher Amplifier Stages Compressor
2	Grating Stretcher All reflective grating based pulse stretcher with 1200 lines/mm grating, stretching factor - >10 000 for 20-fs pulses. Output 300 ps. Wedge -MPA8-10* Ti:sapphire 8-pass multipass amplifer, pulse picker and synchronization electronics included Energy per pulse: 1 mJ Repetition rate: 10 Hz Contrast ratio: > 10^6:1 Stability: < 3 % (regenerative amplifier can be provided for first stage on customer request)* Wedge-MP-10 Pre-Amplifier First amplification stage, 4 pass Ti:sapphire amplifier Energy per pulse: 30 mJ Repetition rate: 10 Hz Contrast ratio: > 10^6:1 Stability: < 3 % Wedge-M4-10 Power Amplifier Second stage of amplification 4-pass amplifier Energy per pulse: >200 mJ Repetition rate: 10 Hz Contrast ratio: > 10^6:1 Stability: < 3 % Amplifier Pump Laser 1 Pump laser for Wedge-MPA8 and Wedge-MP-10 Pre-Amplifier Q-switched Nd:YAG Diode Pumped Laser Wavelength: 532 nm Pulse energy: 280 mJ Repetition rate: 10 Hz Pulse length: 10 ns Amplifier Pump Laser 2 Pump Laser for Wedge-M4-10 Power Amplifier Q-switched Nd:YAG Diode Pumped Laser Wavelength: 532 nm Pulse energy: 800 mJ Repetition rate: 10 Hz Pulse length: 10 ns GP50-10 Grating Pulse Compressor All reflective grating compressor Pulse Length: < 60 fs Energy per pulse: 100 mJ Repetition rate: 10 Hz Contrast ratio: > 10^6:1 Stability: < 3 % Electric: 220 VAC, 50-60Hz System will be assembled and installed on a single vibration damped optical table
	Laser Output: Pulse Length: < 60 fs Energy per pulse: 100 mJ Repetition rate: 10 Hz Contrast ratio: > 10^6:1 Stability: < 3 % Tuning range: 790-810 nm fro 50 fs pulses Gaussian beam: M^2 < 1.1 Beam diameter: 4 mm after focusing
A.5, B	Beam Diagnostics
3	Laser Power Meters Power meters will be provided to measure pump and seed power at different stages in the system. PM-3: Low power meter for laser oscillator 0.03-3W PM-100: High power meters for amplified system and pump lasers up to 100 W Beam Profiler Laser Beam Analyzer Model LBA-710PC: With analog camera, beam profiling hardware and software to provide detailed beam quality measurements at all stages of system. Autocorrelators Reef-RT-50: Real time scanning autocorrelation measurements of seed laser pulse duration. Reef-SS-50: Single shot autocorrelator to measure pulse width of amplifier output for each shot. Complete software and integration included. Spectrometers ASP 800-1250: Near infrared USB spectrometers for real time spectrum of seed laser and amplified pulse. Resolution >0.08 nm. High Resolution Spectrometer High Resolution ( 0.01 nm ) computerized spectrometer range ( 200 – 1000 nm ) with array detector.
C, D	High Vacuum System With Vacuum Chamber For Laser Evaporation
4	UHV vacuum chamber: Dia.12" , with 18 ports, blank flanges, bolts/nuts, gaskets UHV gate valve: 8", pneumo, with position indicator, roughing port, bolts/nuts, gaskets Turbomolecular pump: 8" 560l/s with vent valve and power supply Oil-free mechanical pump: 35m3/h 3 UHV: valves pneumo, with position indicator Pumping controller Vacuum controller: with 1 Penning gauge, 2 Pirani gauges, cables, and 2 spare gauges Quartz crystal monitor: with one shuttered sensor, UHV feed through, sensors kit UHV quick access door 8" with view port UHV silica view ports 6" (uncoated) Moveable (rotating, tilting) target and substrate holders General controller (water, compressed air, power distribution, etc.)
	Installation and Training Installation and training will be conducted onsite and all necessary laser safety equipment and warnings will be included.
	Warranty 1 year parts and service. Additional 2 years parts 10% of system cost.
	Delivery A.1 : 12 Weeks ARO A.2-D: 6 months ARO

Femtosecond Terawatt Ti:sapphire Laser System Teahupoo MPA-XL
Output pulse wavelength: 810 ± 10 nm
Pulse width after compressor: <40 fs
Recommended maximum pulse energy after air compressor: 60 mJ (1.5 TW at 40 fs)
Maximum pulse energy of amplified stretched pulses: 0.2 J
Pulse repetition rate: 10 Hz
Output spectral bandwidth: 30 nm
Output beam diameter: 15 mm
Output beam quality: M2<2
Contrast: >10⁶ for ns time scale
Compressor efficiency: 65%
Output beam polarization: Horizontal

CORTES-E-1 Table –Top Terawatt repetitive rate laser system
Peak Power > 1TW
Pulse duration < 50 fs
Output pulse energy ≥ 50 mJ
Repetition rate 10 Hz
Wavelength Around 800 nm (fixed)
Energy stability Better than 5%
Beam quality M² ≤ 1.6
ns prepulse contrast ratio ≥ 10⁵ : 1
ps prepulse contrast ratio ≥ 10³ : 1 @ 1 ps
≥ 10⁵ : 1 @ 5 ps
≥ 10 ⁶ : 1 @ 10-20 ps
Polarization of the final output beam Linear, Ellipticity < 10^-2

Table Top Ultra High Intensity Ti:Sapphire Laser Cortes-E
Pulse Length: < 60 fs
Energy per pulse: 100 mJ
Repetition rate: 10 Hz
Contrast ratio: > 10⁶:1
Stability: < 3 %
Tuning range: 790-810 nm fro 50 fs pulses
Gaussian beam: M² < 1.1
Beam diameter: 4 mm after focusing

Cortes-800 40 Terawatt Laser System
The new Cortes-800 amplification system provides terawatt peak power in a compact package. Seeded with our compact Trestles Ti:sapphire oscillator, the Cortes-800 consists of three chirped pulse amplification (CPA) stages that fit on a single optical table. Pulse energies of greater than 1.5 J are achieved before compression in a vacuum chamber. Active feedback and pulse shaping allows the Cortes-800 to produce extremely high contrast ratios, and sub 30 fs output pulses with peak powers greater than 40 terawatts. Fully integrated timing and control software make the Cortes- 800 a perfect tool for the study of high energy laser- matter interaction. The initial stage of the system consists of the TRESTLES-20 femtosecond oscillator pumped with a 532 nm, 6 W DPSS laser. Generated 20 fs pulses are temporally stretched with Offner triplet technology to 400 ps. To pre-correct for spectral changes incurred as pulses pass through the system, the stretched pulses pass through an acousto-optic programmable dispersive filter. The AOPDF compensates for gain narrowing and wavelength shifting in the amplification stages and for dispersion due to propagation through system components. Before insertion into the first amplification stage, a PISMO Pockels cell pulse picker is used to gate single pulses at a repetition rate of 10 Hz from the oscillator pulse train. The stretched, shaped and picked pulses are then amplified by a WEDGE-10 multi-pass amplifier, providing high contrast ratio. After the initial amplification stage the pulses pass through a spatial filter to increase the beam diameter and improve the spatial quality of the beam. A second PISMO Pockels cell is used to increase the temporal contrast ratio and to protect STAGE-1 from back reflections. The spatially expanded pulses pass through STAGE-2, a 5-pass multi-pass amplifier. Another spatial filter is used to clean the beam before the final amplifying stage, STAGE- 3. The 4-pass power amplifier increases the pulse energy to 1,500 mJ per pulse. Pulse compression takes place within a sealed vacuum chamber with a dielectric grating compressor. Grating position, and thus final pulse duration, are adjusted with the help of computer controlled motorized stages. A deformable mirror (DM) coupled with a Shack-Hartmann wavefront sensor is used to correct wavefront distortions, resulting in a 0.8 Strehl ratio.

Del Mar Photonics, Inc.
4119 Twilight Ridge
San Diego, CA 92130
tel: (858) 876-3133
fax: (858) 630-2376
Skype: delmarphotonics
sales@dmphotonics.com